Plasma-Enhanced Atomic Layer Deposition of Cobalt and Cobalt Nitride: What Controls the Incorporation of Nitrogen?
نویسندگان
چکیده
منابع مشابه
Introduction to (plasma-enhanced) atomic layer deposition
Film growth by the atomic layer deposition (ALD) method relies on alternate pulsing of the precursor gases and vapors into a vacuum chamber and their subsequent chemisorption on the substrate surface (Fig. 1) [1,2]. The different steps in the process are saturative such that ALD film growth is self-limiting yielding one submonolayer of film per deposition cycle. ALD has some unique characterist...
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Hexagonal boron nitride (h-BN) has been previously manufactured using mechanical exfoliation and chemical vapor deposition methods, which make the large-scale synthesis of uniform h-BN very challenging. In this study, we produced highly uniform and scalable h-BN films by plasma-enhanced atomic layer deposition, which were characterized by various techniques including atomic force microscopy, tr...
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چکیده هدف از این کار بررسی الکترواکسیداسیون کتکول و مشتقات آن در حضور 4-فنیل سمی کاربامازید بوده است اکسیداسیون کتکولها ترکیبات نا پایدار کینونها را تولید می کنند که این ترکیبات می تواند در واکنش مایکل بعنوان پذیرنده نوکلئوفیل عمل نمایند. در ادامه اکسایش کتکولهای (a-c1) را درحضور 4-فنیل سمی کاربامازید در محلول آب/استونیتریل (90/10)بوسیله ولتامتری چرخه ای و کولن متری در پتانسیل ثابت مورد بررسی ...
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ژورنال
عنوان ژورنال: The Journal of Physical Chemistry C
سال: 2020
ISSN: 1932-7447,1932-7455
DOI: 10.1021/acs.jpcc.0c04223